RF and mmW Applications

Wafer level RF and mmW characterization is a critical part of RF and microwave IC's development, design debug and modeling of modern high-performance semiconductor devices. It includes S-parameters measurements, source and load pull impedance matching for RF power and RF noise characterization. These applications challenge the system for its high mechanical stability, integration of test instrumentation components positioning relative to the DUT, consistent contact quality, repeatability on different DUT pad metallization, as well as accurate wafer-level system RF calibration.

 

The rigid MPI Engineering Probe Systems are the ideal choice for RF and mmW measurement applications. The compact footprint ideally fits to the requirements of integration with complex RF power and Noise characterization systems. Accurate and back-lash free RF MicroPositioners provide precise positioning of the RF probes. The high-end mm-wave MP80 MicroPositioner and the single-tube MPI SZ10 or MZ12 microscopes with high magnification and long working distance Optics for integration of the mmW and sub-mmW VNA heads as close as possible to the DUT, providing the shortest signal path and guaranteeing best possible measurement accuracy and directivity.

 

MPI ASP RF Probe Series with its unique design and MEMS manufactured tips provide low resistance and high consistency of the contact even on hard to probe Aluminum pads.

 

Unique QAlibria™ calibration software and Calibration Substrates realize industry-standard and advanced calibration methods, as well as the metrological-level RF calibration solutions.

 

A great variety of RF and mmW cables and Accessories are available. These are carefully selected and based upon extensive RF and mmW measurement experience to ensure best performance when integrated with different VNAs.

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